Global Sputtering Target Material Sales Market Report 2020
Sputtering is the process of forming a thin film when the object is attached to the target substrate by the sputtering and scattering, and the sputtering target is the material for high-speed particle bombardment. This report studies the sputtering target material market.
Semiconductor chips, flat panel displays, solar cells and other downstream industries have a higher demand on the product quality and stability. When the downstream customers, especially the world's leading companies select suppliers, the supplier qualification barriers are higher, and the certification cycle is longer.For a long time the global sputtering target development and production mainly concentrated in the Europe, United States and Japan, and the industry concentration is quite high. Manufactures of sputtering targets, represented by Mitsui Mining & Smelting (Japan), Praxair (USA), JX Nippon Mining & Metals Corporation (Japan), Plansee SE (Austria), Hitachi Metals (Japan), Honeywell (USA), Sumitomo Chemical (Japan), ULVAC (Japan) and other multinational groups, have been involved in this field earlier. After decades of technical accumulation, they occupy the vast majority of market share.
Market Analysis and Insights: Global Sputtering Target Material Market
The global Sputtering Target Material market size is projected to reach US$ 6275.1 million by 2026, from US$ 4088.8 million in 2020, at a CAGR of 7.4% during 2021-2026.
Global Sputtering Target Material Scope and Market Size
The global Sputtering Target Material market is segmented by company, region (country), by Type, and by Application. Players, stakeholders, and other participants in the global Sputtering Target Material market will be able to gain the upper hand as they use the report as a powerful resource. The segmental analysis focuses on sales, revenue and forecast by region (country), by Type and by Application for the period 2015-2026.
Segment by Type, the Sputtering Target Material market is segmented into
Metal Target
Alloy Target
Ceramic Compound Target
Segment by Application, the Sputtering Target Material market is segmented into
Semiconductor
Solar Energy
LCD Flat Panel Display
Others Flat Panel Display
The Sputtering Target Material market is analysed and market size information is provided by regions (countries). Segment by Application, the Sputtering Target Material market is segmented into United States, Europe, China, Japan, Southeast Asia, India and Rest of World.
The report includes region-wise market size for the period 2015-2026. It also includes market size and forecast by players, by Type, and by Application segment in terms of sales and revenue for the period 2015-2026.
Sputtering Target Material market competitive landscape provides details and data information by players. The report offers comprehensive analysis and accurate statistics on revenue by the player for the period 2015-2020. It also offers detailed analysis supported by reliable statistics on revenue (global and regional level) by players for the period 2015-2020. Details included are company description, major business, company total revenue and the sales, revenue generated in Sputtering Target Material business, the date to enter into the Sputtering Target Material market, Sputtering Target Material product introduction, recent developments, etc.
The major vendors covered:
Materion (Heraeus)
JX Nippon Mining & Metals Corporation
Praxair
Plansee SE
Mitsui Mining & Smelting
Hitachi Metals
Honeywell
Sumitomo Chemical
ULVAC
GRIKIN Advanced Material Co., Ltd.
TOSOH
Ningbo Jiangfeng
Heesung
Luvata
Fujian Acetron New Materials Co., Ltd
Changzhou Sujing Electronic Material
Luoyang Sifon Electronic Materials
FURAYA Metals Co., Ltd
Advantec
Angstrom Sciences
Umicore Thin Film Products
Semiconductor chips, flat panel displays, solar cells and other downstream industries have a higher demand on the product quality and stability. When the downstream customers, especially the world's leading companies select suppliers, the supplier qualification barriers are higher, and the certification cycle is longer.For a long time the global sputtering target development and production mainly concentrated in the Europe, United States and Japan, and the industry concentration is quite high. Manufactures of sputtering targets, represented by Mitsui Mining & Smelting (Japan), Praxair (USA), JX Nippon Mining & Metals Corporation (Japan), Plansee SE (Austria), Hitachi Metals (Japan), Honeywell (USA), Sumitomo Chemical (Japan), ULVAC (Japan) and other multinational groups, have been involved in this field earlier. After decades of technical accumulation, they occupy the vast majority of market share.
Market Analysis and Insights: Global Sputtering Target Material Market
The global Sputtering Target Material market size is projected to reach US$ 6275.1 million by 2026, from US$ 4088.8 million in 2020, at a CAGR of 7.4% during 2021-2026.
Global Sputtering Target Material Scope and Market Size
The global Sputtering Target Material market is segmented by company, region (country), by Type, and by Application. Players, stakeholders, and other participants in the global Sputtering Target Material market will be able to gain the upper hand as they use the report as a powerful resource. The segmental analysis focuses on sales, revenue and forecast by region (country), by Type and by Application for the period 2015-2026.
Segment by Type, the Sputtering Target Material market is segmented into
Metal Target
Alloy Target
Ceramic Compound Target
Segment by Application, the Sputtering Target Material market is segmented into
Semiconductor
Solar Energy
LCD Flat Panel Display
Others Flat Panel Display
The Sputtering Target Material market is analysed and market size information is provided by regions (countries). Segment by Application, the Sputtering Target Material market is segmented into United States, Europe, China, Japan, Southeast Asia, India and Rest of World.
The report includes region-wise market size for the period 2015-2026. It also includes market size and forecast by players, by Type, and by Application segment in terms of sales and revenue for the period 2015-2026.
Competitive Landscape
and Sputtering Target Material Market Share AnalysisSputtering Target Material market competitive landscape provides details and data information by players. The report offers comprehensive analysis and accurate statistics on revenue by the player for the period 2015-2020. It also offers detailed analysis supported by reliable statistics on revenue (global and regional level) by players for the period 2015-2020. Details included are company description, major business, company total revenue and the sales, revenue generated in Sputtering Target Material business, the date to enter into the Sputtering Target Material market, Sputtering Target Material product introduction, recent developments, etc.
The major vendors covered:
Materion (Heraeus)
JX Nippon Mining & Metals Corporation
Praxair
Plansee SE
Mitsui Mining & Smelting
Hitachi Metals
Honeywell
Sumitomo Chemical
ULVAC
GRIKIN Advanced Material Co., Ltd.
TOSOH
Ningbo Jiangfeng
Heesung
Luvata
Fujian Acetron New Materials Co., Ltd
Changzhou Sujing Electronic Material
Luoyang Sifon Electronic Materials
FURAYA Metals Co., Ltd
Advantec
Angstrom Sciences
Umicore Thin Film Products
Frequently Asked Questions
This market study covers the global and regional market with an in-depth analysis of the overall growth prospects in the market. Furthermore, it sheds light on the comprehensive competitive landscape of the global market. The report further offers a dashboard overview of leading companies encompassing their successful marketing strategies, market contribution, recent developments in both historic and present contexts.
- By product type
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The report provides a detailed evaluation of the market by highlighting information on different aspects which include drivers, restraints, opportunities, and threats. This information can help stakeholders to make appropriate decisions before investing.
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