Global Sputtering Target Material Market Research Report 2019

The global Sputtering Target Material market was valued at 3160.27 million US$ in 2018 is expected to reach 5249.07 million US$ by the end of 2025, growing at a CAGR of 7.49% during 2019-2025.

This report focuses on Sputtering Target Material value at global level, regional level and company level. From a global perspective, this report represents overall Sputtering Target Material market size by analyzing historical data and future prospect. Regionally, this report focuses on several key regions: North America, Europe, China and Japan.

At company level, this report focuses on the revenue and market share for each manufacturer covered in this report.

The following manufacturers are covered:
1 JX Nippon Mining & Metals Corporation
2 Praxair
3 Plansee SE
4 Mitsui Mining & Smelting
5 Hitachi Metals
6 Honeywell
7 Sumitomo Chemical
8 ULVAC
9 Materion (Heraeus)
10 GRIKIN Advanced Material Co., Ltd.
11 TOSOH
12 Ningbo Jiangfeng
13 Heesung
14 Luvata
15 Fujian Acetron New Materials Co., Ltd
16 Changzhou Sujing Electronic Material
17 Luoyang Sifon Electronic Materials
18 FURAYA Metals Co., Ltd
19 Advantec
20 Angstrom Sciences
21 Umicore Thin Film Products

Segment by Regions
North America
Europe
China
Japan
Rest of World

Segment by Type
1 Metal Target
2 Alloy Target
3 Ceramic Compound Target

Segment by Application
1 Semiconductor
2 Solar Energy
3 LCD Flat Panel Display
4 Others Flat Panel Display