Global Plasma Etch System Market Research Report 2020

This report studies the Plasma Etch System market. Plasma Etching System is a series of devices and equipment used together to perform plasma etching.

Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be either charged (ions) or neutral (atoms and radicals). During the process, the plasma generates volatile etch products at room temperature from the chemical reactions between the elements of the material etched and the reactive species generated by the plasma. Eventually the atoms of the shot element embed themselves at or just below the surface of the target, thus modifying the physical properties of the target.
North America ranks the top in terms of global market size of Plasma Etch System, it consists of 48.57% of the international market in 2016. Japan comes the second, with 20.03% of the global market. Europe consists of 12.51% of the Plasma Etch System market in the same year, the other regions all together consist of 8.81%.

Market Analysis and Insights: Global Plasma Etch System Market
The global Plasma Etch System market is valued at 4963.1 million US$ in 2020 is expected to reach 11070 million US$ by the end of 2026, growing at a CAGR of 12.0% during 2021-2026.
Global Plasma Etch System Market: Drivers and Restrains
The research report has incorporated the analysis of different factors that augment the market’s growth. It constitutes trends, restraints, and drivers that transform the market in either a positive or negative manner. This section also provides the scope of different segments and applications that can potentially influence the market in the future. The detailed information is based on current trends and historic milestones. This section also provides an analysis of the volume of production about the global market and also about each type from 2015 to 2026. This section mentions the volume of production by region from 2015 to 2026. Pricing analysis is included in the report according to each type from the year 2015 to 2026, manufacturer from 2015 to 2020, region from 2015 to 2020, and global price from 2015 to 2026.
A thorough evaluation of the restrains included in the report portrays the contrast to drivers and gives room for strategic planning. Factors that overshadow the market growth are pivotal as they can be understood to devise different bends for getting hold of the lucrative opportunities that are present in the ever-growing market. Additionally, insights into market expert’s opinions have been taken to understand the market better.
Market Segment Analysis
The research report includes specific segments by Type and by Application. Each type provides information about the production during the forecast period of 2015 to 2026. Application segment also provides consumption during the forecast period of 2015 to 2026. Understanding the segments helps in identifying the importance of different factors that aid the market growth.
Segment by Type
Inductively Coupled Plasma (ICP)
Reactive Ion Etching (RIE)
Deep Reactive Ion Etching (DRIE)
Others

Segment by Application
Semiconductor Industry
Medical Industry
Electronics & Microelectronics
Others

Global Plasma Etch System Market: Regional Analysis
The report offers in-depth assessment of the growth and other aspects of the Plasma Etch System market in important regions, including the U.S., Canada, Germany, France, U.K., Italy, Russia, China, Japan, South Korea, Taiwan, Southeast Asia, Mexico, and Brazil, etc. Key regions covered in the report are North America, Europe, Asia-Pacific and Latin America.
The report has been curated after observing and studying various factors that determine regional growth such as economic, environmental, social, technological, and political status of the particular region. Analysts have studied the data of revenue, production, and manufacturers of each region. This section analyses region-wise revenue and volume for the forecast period of 2015 to 2026. These analyses will help the reader to understand the potential worth of investment in a particular region.
Global Plasma Etch System Market:

Competitive Landscape


This section of the report identifies various key manufacturers of the market. It helps the reader understand the strategies and collaborations that players are focusing on combat competition in the market. The comprehensive report provides a significant microscopic look at the market. The reader can identify the footprints of the manufacturers by knowing about the global revenue of manufacturers, the global price of manufacturers, and production by manufacturers during the forecast period of 2015 to 2019.
The major players in the market include Oxford Instruments, ULVAC, Lam Research, AMEC, PlasmaTherm, SAMCO Inc., Applied Materials, Inc., Sentech, SPTS Technologies (an Orbotech Company), GigaLane, CORIAL, Trion Technology, NAURA, Plasma Etch, Inc., Tokyo Electron Limited, etc.

Frequently Asked Questions



This market study covers the global and regional market with an in-depth analysis of the overall growth prospects in the market. Furthermore, it sheds light on the comprehensive competitive landscape of the global market. The report further offers a dashboard overview of leading companies encompassing their successful marketing strategies, market contribution, recent developments in both historic and present contexts.

  • By product type
  • By End User/Applications
  • By Technology
  • By Region

The report provides a detailed evaluation of the market by highlighting information on different aspects which include drivers, restraints, opportunities, and threats. This information can help stakeholders to make appropriate decisions before investing.

Please Select a Format

market Reports market Reports