Global Plasma Etch System Market Insights, Forecast to 2025

This report studies the Plasma Etch System market. Plasma Etching System is a series of devices and equipment used together to perform plasma etching.

Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be either charged (ions) or neutral (atoms and radicals). During the process, the plasma generates volatile etch products at room temperature from the chemical reactions between the elements of the material etched and the reactive species generated by the plasma. Eventually the atoms of the shot element embed themselves at or just below the surface of the target, thus modifying the physical properties of the target.

North America ranks the top in terms of global market size of Plasma Etch System, it consists of 48.57% of the international market in 2016. Japan comes the second, with 20.03% of the global market. Europe consists of 12.51% of the Plasma Etch System market in the same year, the other regions all together consist of 8.81%.

Applied Materials, Inc. ranks the first in terms of revenue share in Global market of Plasma Etch System, occupies 24.12% of market share in 2016; While, Lam Research, with a market share of 22.89%, comes the second; Tokyo Electron Limited, with a market share of 17.36% in 2016, comes the third. All the other manufacturers which are not included in the report together consist of approximately 27.02% of the global market in 2016.
The Plasma Etch System market was valued at 3910 Million US$ in 2018 and is projected to reach 9690 Million US$ by 2025, at a CAGR of 12.0% during the forecast period. In this study, 2018 has been considered as the base year and 2019 to 2025 as the forecast period to estimate the market size for Plasma Etch System.

This report presents the worldwide Plasma Etch System market size (value, production and consumption), splits the breakdown (data status 2014-2019 and forecast to 2025), by manufacturers, region, type and application.
This study also analyzes the market status, market share, growth rate, future trends, market drivers, opportunities and challenges, risks and entry barriers, sales channels, distributors and Porter's Five Forces Analysis.

The following manufacturers are covered in this report:
Oxford Instruments
ULVAC
Lam Research
AMEC
PlasmaTherm
SAMCO Inc.
Applied Materials, Inc.
Sentech
SPTS Technologies (an Orbotech Company)
GigaLane
CORIAL
Trion Technology
NAURA
Plasma Etch, Inc.
Tokyo Electron Limited

Plasma Etch System Breakdown Data by Type
Inductively Coupled Plasma (ICP)
Reactive Ion Etching (RIE)
Deep Reactive Ion Etching (DRIE)
Others
Plasma Etch System Breakdown Data by Application
Semiconductor Industry
Medical Industry
Electronics & Microelectronics
Others

Plasma Etch System Production by Region
United States
Europe
China
Japan
Other Regions

Plasma Etch System Consumption by Region
North America
United States
Canada
Mexico
Asia-Pacific
China
India
Japan
South Korea
Australia
Indonesia
Malaysia
Philippines
Thailand
Vietnam
Europe
Germany
France
UK
Italy
Russia
Rest of Europe
Central & South America
Brazil
Rest of South America
Middle East & Africa
GCC Countries
Turkey
Egypt
South Africa
Rest of Middle East & Africa

The study objectives are:
To analyze and research the global Plasma Etch System status and future forecast,involving, production, revenue, consumption, historical and forecast.
To present the key Plasma Etch System manufacturers, production, revenue, market share, and recent development.
To split the breakdown data by regions, type, manufacturers and applications.
To analyze the global and key regions market potential and advantage, opportunity and challenge, restraints and risks.
To identify significant trends, drivers, influence factors in global and regions.
To analyze competitive developments such as expansions, agreements, new product launches, and acquisitions in the market.

In this study, the years considered to estimate the market size of Plasma Etch System :
History Year: 2014 - 2018
Base Year: 2018
Estimated Year: 2019
Forecast Year: 2019 - 2025

This report includes the estimation of market size for value (million USD) and volume (Units). Both top-down and bottom-up approaches have been used to estimate and validate the market size of Plasma Etch System market, to estimate the size of various other dependent submarkets in the overall market. Key players in the market have been identified through secondary research, and their market shares have been determined through primary and secondary research. All percentage shares, splits, and breakdowns have been determined using secondary sources and verified primary sources.

For the data information by region, company, type and application, 2018 is considered as the base year. Whenever data information was unavailable for the base year, the prior year has been considered.

Frequently Asked Questions



This market study covers the global and regional market with an in-depth analysis of the overall growth prospects in the market. Furthermore, it sheds light on the comprehensive competitive landscape of the global market. The report further offers a dashboard overview of leading companies encompassing their successful marketing strategies, market contribution, recent developments in both historic and present contexts.

  • By product type
  • By End User/Applications
  • By Technology
  • By Region

The report provides a detailed evaluation of the market by highlighting information on different aspects which include drivers, restraints, opportunities, and threats. This information can help stakeholders to make appropriate decisions before investing.

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