Global Photomask Inspection Equipment Market Professional Survey Report 2019
Photomask Inspection Equipment is fab equipment that is used, before lithography, to inspect photomasks for defects during the production of semiconductor wafers. It is also used for R&D purposes. The increase in the application of semiconductor integrated circuits (ICs) in segments like consumer electronics, automobiles, and industries is prompting IC vendors to raise their production scales. This will compel the vendors to demand more Photomask Inspection Equipment to ensure maximum reliability of their offerings.
The semiconductor market is shifting toward complex and miniaturized devices. Semiconductor device manufacturers need higher inspection sensitivity as they move toward lower node sizes (10nm and beyond). The migration will introduce complex structures and designs, as well as new materials.
Broadly speaking, we believe there are three factors that affect sales of Mask Inspection Systems: (1) growth in the number of mask layers in tandem with the shift to finer process rules; (2) investment timing by leading-edge logic foundries (3) investment by mask shops.
The global Photomask Inspection Equipment market was valued at xx million US$ in 2018 and will reach xx million US$ by the end of 2025, growing at a CAGR of xx% during 2019-2025.
This report focuses on Photomask Inspection Equipment volume and value at global level, regional level and company level. From a global perspective, this report represents overall Photomask Inspection Equipment market size by analyzing historical data and future prospect.
Regionally, this report categorizes the production, apparent consumption, export and import of Photomask Inspection Equipment in North America, Europe, China, Japan, Southeast Asia and India.
For each manufacturer covered, this report analyzes their Photomask Inspection Equipment manufacturing sites, capacity, production, ex-factory price, revenue and market share in global market.
The following manufacturers are covered:
KLA-Tencor
Applied Materials
Lasertec
Carl Zeiss
ASML (HMI)
...
Segment by Regions
North America
Europe
China
Japan
Southeast Asia
India
Segment by Type
Die to Die (DD) Method
Die to Database (DB) Method
Segment by Application
Semiconductor Device Manufacturers
Mask Shops
The semiconductor market is shifting toward complex and miniaturized devices. Semiconductor device manufacturers need higher inspection sensitivity as they move toward lower node sizes (10nm and beyond). The migration will introduce complex structures and designs, as well as new materials.
Broadly speaking, we believe there are three factors that affect sales of Mask Inspection Systems: (1) growth in the number of mask layers in tandem with the shift to finer process rules; (2) investment timing by leading-edge logic foundries (3) investment by mask shops.
The global Photomask Inspection Equipment market was valued at xx million US$ in 2018 and will reach xx million US$ by the end of 2025, growing at a CAGR of xx% during 2019-2025.
This report focuses on Photomask Inspection Equipment volume and value at global level, regional level and company level. From a global perspective, this report represents overall Photomask Inspection Equipment market size by analyzing historical data and future prospect.
Regionally, this report categorizes the production, apparent consumption, export and import of Photomask Inspection Equipment in North America, Europe, China, Japan, Southeast Asia and India.
For each manufacturer covered, this report analyzes their Photomask Inspection Equipment manufacturing sites, capacity, production, ex-factory price, revenue and market share in global market.
The following manufacturers are covered:
KLA-Tencor
Applied Materials
Lasertec
Carl Zeiss
ASML (HMI)
...
Segment by Regions
North America
Europe
China
Japan
Southeast Asia
India
Segment by Type
Die to Die (DD) Method
Die to Database (DB) Method
Segment by Application
Semiconductor Device Manufacturers
Mask Shops
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