Aluminum Sputtering Target is a material that is used to create thin films in a technique known as sputter deposition, or thin film deposition.

The global Aluminum Sputtering Target market was valued at xx million US$ in 2018 and will reach xx million US$ by the end of 2025, growing at a CAGR of xx% during 2019-2025.
This report focuses on Aluminum Sputtering Target volume and value at global level, regional level and company level. From a global perspective, this report represents overall Aluminum Sputtering Target market size by analyzing historical data and future prospect.
Regionally, this report categorizes the production, apparent consumption, export and import of Aluminum Sputtering Target in North America, Europe, China, Japan, Southeast Asia and India.
For each manufacturer covered, this report analyzes their Aluminum Sputtering Target manufacturing sites, capacity, production, ex-factory price, revenue and market share in global market.

The following manufacturers are covered:
ESPI Metals
Tosoh
KFMI
KJLC
GRIKIN Advanced Material
Ningbo Jiangfeng
Angstrom Sciences
Plansee
American Elements

Segment by Regions
North America
Europe
China
Japan
Southeast Asia
India

Segment by Type
Low Purity Aluminum Sputtering Target
High Purity Aluminum Sputtering Target
Ultra High Purity Aluminum Sputtering Target

Segment by Application
Semiconductors
Solar Cell
LCD Displays
Other